Reaction Kinetics in the Hydrothermal Oxidation of Hf

HIDEO TORAYA, Masahiro Yoshimura, SHIGEYUKI SMIYA

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4 Citations (Scopus)

Abstract

The hydrothermal oxidation of Hf was studied using metal powders and chips to change the surface‐area effect. Fine monoclinic HfO2 powders (32 to 34 nm) were formed through two parallel reaction paths, one the oxidation of Hf with H2O and the other the consecutive reaction via formation of Hf hydride. Based on the experimental results at 500°C under 100 MPa, three reaction rate constants were determined for two kinds of starting materials. The relative widths of two paths were proved to be independent of the size of starting materials, and the pulverization and oxidation of both metal powders and chips could be explained by the same mechanism, where the formation of hydride was a driving force in pulverization.

Original languageEnglish
Pages (from-to)818-822
Number of pages5
JournalJournal of the American Ceramic Society
Volume66
Issue number11
DOIs
Publication statusPublished - 1983 Jan 1

All Science Journal Classification (ASJC) codes

  • Ceramics and Composites
  • Materials Chemistry

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