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Reaction mechanisms in both a CCl2F2/O2/Ar and a CCl2F2/H2/Ar RF plasma environment

  • Ya Feng Wang
  • , Wen Jhy Lee
  • , Chuh Yung Chen
  • , Yo Ping Greg Wu
  • , Guo Ping Chang-Chien

Research output: Contribution to journal › Article › peer-review

18   Link opens in a new tab Citations (Scopus)

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