Reactive sputter deposition of metal containing hydrogenated amorphous carbon coatings exhibiting self-assembled alternating nanolayers

Jyh Ming Ting, Wan Yu Wu

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

A reactive magnetron sputtering deposition technique was used for the deposition of a-C:H/Me coatings on different substrates under various deposition conditions. Several metal targets, including Al, Si, Fe, Ni, Cu, and Pt, were used. Depending on the growth condition, metal type, and substrate material, the obtained a-C:H/Me coatings were found to exhibit various microstructures. The conditions that favor the formation of alternating nanolayer structure are studied and determined; therefore a processing window was obtained.

Original languageEnglish
Pages (from-to)2-5
Number of pages4
JournalSurface and Coatings Technology
Volume231
DOIs
Publication statusPublished - 2013 Sep 25

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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