Abstract
Effect of an amorphous Si (a-Si) underlayer on the residual stress and hardness of the two-layer C/Si films has been investigated. Amorphous carbon films either with or without amorphous Si underlayer were deposited on Si (100) substrates by means of ultra-high-vacuum ion beam sputtering at room temperature (RT). Both kinds of films have amorphous microstructure and smooth morphology. The as-deposited C films were tetrahedral amorphous carbon (ta-C) with primary sp3 bonding and different G-peak shift via Raman spectra. The residual stress of single 100 nm a-C film was about 11.98 GPa in compression and its hardness was 18.35 GPa at RT. The compressive residual stress of the C/Si film was decreased to 5.76 GPa with the addition of 50 nm a-Si underlayer and its hardness retained at about 17.69 GPa at RT. Effect of C thickness on C/a-Si residual stress and hardness were also discussed. The addition of a-Si layer has a great contribution to decrease the compressive residual stress and retains hardness, which is good for the suppression of the buckling or wrinkling in the C film.
Original language | English |
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Pages (from-to) | 1149-1153 |
Number of pages | 5 |
Journal | Surface and Coatings Technology |
Volume | 202 |
Issue number | 4-7 |
DOIs | |
Publication status | Published - 2007 Dec 15 |
All Science Journal Classification (ASJC) codes
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry