Resist trimming in high-density CF4/O2 plasmas for sub-0.1 μm device fabrication

Chian Yuh Sin, Bing Hung Chen, W. L. Loh, J. Yu, P. Yelehanka, A. See, L. Chan

Research output: Contribution to journalArticlepeer-review

25 Citations (Scopus)

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Engineering & Materials Science

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