Robust High-k HfOxNy n-MOSFETs Using Low Work Function TbN Gate

Shui-Jinn Wang, Nai Chao Sui, Chien Hung Wu, Chen Kuo Chiang, Ching-Cheng Cheng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationInternational Conference on Solid State Devices and materials (SSDM'07)
Place of PublicationTsukuba International Congress Center, Ibaraki, Japan
Publication statusPublished - 2007 Sep 18

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