Role of pore structure in the nitridation of silicon/silicon nitride compacts

Jow-Lay Huang, Shun Wen Chen, Horng Hwa Lu, Wen Hu Chan

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

The effects of the pore-size distribution in silicon compacts on the nitridation kinetics were investigated. Various compositions of silicon nitride inert filler materials were added to silicon compacts to control pore structure. Samples having a higher pore volume and a larger pore diameter reacted faster at temperatures below 1200°C, the reaction started at lower temperatures and the samples showed more weight gain and less residual silicon. The pore value was reduced and the strength was improved by decreasing nitridation rate.

Original languageEnglish
Pages (from-to)27-31
Number of pages5
JournalCeramics International
Volume22
Issue number1
DOIs
Publication statusPublished - 1996 Jan 1

Fingerprint

Nitridation
Silicon
Pore structure
Silicon nitride
Pore size
Fillers
Temperature
Kinetics
Chemical analysis
silicon nitride

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Huang, Jow-Lay ; Chen, Shun Wen ; Lu, Horng Hwa ; Chan, Wen Hu. / Role of pore structure in the nitridation of silicon/silicon nitride compacts. In: Ceramics International. 1996 ; Vol. 22, No. 1. pp. 27-31.
@article{7973b18b49ad42509a3ba8ed6e9b4cda,
title = "Role of pore structure in the nitridation of silicon/silicon nitride compacts",
abstract = "The effects of the pore-size distribution in silicon compacts on the nitridation kinetics were investigated. Various compositions of silicon nitride inert filler materials were added to silicon compacts to control pore structure. Samples having a higher pore volume and a larger pore diameter reacted faster at temperatures below 1200°C, the reaction started at lower temperatures and the samples showed more weight gain and less residual silicon. The pore value was reduced and the strength was improved by decreasing nitridation rate.",
author = "Jow-Lay Huang and Chen, {Shun Wen} and Lu, {Horng Hwa} and Chan, {Wen Hu}",
year = "1996",
month = "1",
day = "1",
doi = "10.1016/0272-8842(95)00049-6",
language = "English",
volume = "22",
pages = "27--31",
journal = "Ceramics International",
issn = "0272-8842",
publisher = "Elsevier Limited",
number = "1",

}

Role of pore structure in the nitridation of silicon/silicon nitride compacts. / Huang, Jow-Lay; Chen, Shun Wen; Lu, Horng Hwa; Chan, Wen Hu.

In: Ceramics International, Vol. 22, No. 1, 01.01.1996, p. 27-31.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Role of pore structure in the nitridation of silicon/silicon nitride compacts

AU - Huang, Jow-Lay

AU - Chen, Shun Wen

AU - Lu, Horng Hwa

AU - Chan, Wen Hu

PY - 1996/1/1

Y1 - 1996/1/1

N2 - The effects of the pore-size distribution in silicon compacts on the nitridation kinetics were investigated. Various compositions of silicon nitride inert filler materials were added to silicon compacts to control pore structure. Samples having a higher pore volume and a larger pore diameter reacted faster at temperatures below 1200°C, the reaction started at lower temperatures and the samples showed more weight gain and less residual silicon. The pore value was reduced and the strength was improved by decreasing nitridation rate.

AB - The effects of the pore-size distribution in silicon compacts on the nitridation kinetics were investigated. Various compositions of silicon nitride inert filler materials were added to silicon compacts to control pore structure. Samples having a higher pore volume and a larger pore diameter reacted faster at temperatures below 1200°C, the reaction started at lower temperatures and the samples showed more weight gain and less residual silicon. The pore value was reduced and the strength was improved by decreasing nitridation rate.

UR - http://www.scopus.com/inward/record.url?scp=0029778559&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029778559&partnerID=8YFLogxK

U2 - 10.1016/0272-8842(95)00049-6

DO - 10.1016/0272-8842(95)00049-6

M3 - Article

VL - 22

SP - 27

EP - 31

JO - Ceramics International

JF - Ceramics International

SN - 0272-8842

IS - 1

ER -