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Roles of N
2
O and O
2
Gas Additives
Y. Tzeng
, T. H. Lin
Institute of Microelectronics
Master Degree Program on Nano-Integrated-Circuit Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
28
Citations (Scopus)
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Chemical Compounds
Silicon
Gases
Fluorine
Etching
Optical emission spectroscopy
Chemisorption
Glow discharges
Dry etching
Oxygen
X ray photoelectron spectroscopy
Sulfur
Gas mixtures
Contamination
Plasmas
Engineering & Materials Science
Silicon
Gases
Fluorine
Etching
Optical emission spectroscopy
Oxygen
Chemisorption
Glow discharges
Dry etching
X ray photoelectron spectroscopy
Gas mixtures
Contamination
Sulfur
Plasmas