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Roles of N
2
O and O
2
Gas Additives
Y. Tzeng
, T. H. Lin
Institute of Microelectronics
Master Degree Program on Nano-Integrated-Circuit Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
28
Citations (Scopus)
Overview
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2
O and O
2
Gas Additives'. Together they form a unique fingerprint.
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Chemical Compounds
Etching
100%
Additive
74%
Fluorine Atom
64%
Gas
58%
Optical Emission Spectroscopy
46%
Glow Discharge
44%
Dioxygen
35%
Chemisorption
33%
Plasma
22%
Mixture
16%
Amount
15%
Surface
11%
Engineering & Materials Science
Silicon
87%
Gases
63%
Fluorine
43%
Etching
34%
Optical emission spectroscopy
26%
Chemisorption
24%
Glow discharges
23%
X ray photoelectron spectroscopy
19%
Gas mixtures
17%
Contamination
15%
Sulfur
15%
Plasmas
14%