Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer

Yueh Chieh Chu, Gerald Jiang, Chi Chang, Jyh-Ming Ting, Hsin Le Lee, Yon-Hua Tzeng

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper reports on room-temperature high-density diamond seeding for low-temperature microwave plasma enhanced chemical vapor deposition of nanocrystalline diamond (NCD) on W/Si substrates. A tungsten layer acts as a diamond nucleation-enhancing layer. Formation of tungsten-carbide (WC) complex increases the initial nucleation density and plays an important role in facilitating diamond growth characteristics. Microwave plasma-enhanced chemical vapor deposition is applied to synthesize diamond films in Ar diluted by methane without hydrogen additives at low temperature. NCD seeding and film formation were investigated as a function of the thickness of tungsten interfacial layer. Raman spectroscopy, SEM, AFM and TEM were applied to characterize NCD films in order to gain insight into the initial stage of NCD diamond synthesis.

Original languageEnglish
Title of host publication2011 11th IEEE International Conference on Nanotechnology, NANO 2011
Pages1367-1370
Number of pages4
DOIs
Publication statusPublished - 2011
Event2011 11th IEEE International Conference on Nanotechnology, NANO 2011 - Portland, OR, United States
Duration: 2011 Aug 152011 Aug 19

Other

Other2011 11th IEEE International Conference on Nanotechnology, NANO 2011
CountryUnited States
CityPortland, OR
Period11-08-1511-08-19

Fingerprint

Nanodiamonds
Tungsten
Diamond
Plasma enhanced chemical vapor deposition
inoculation
Diamonds
tungsten
diamonds
Microwaves
vapor deposition
microwaves
room temperature
Diamond films
Temperature
diamond films
Nucleation
nucleation
tungsten carbides
Tungsten carbide
Methane

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Electrical and Electronic Engineering
  • Materials Chemistry
  • Condensed Matter Physics

Cite this

Chu, Y. C., Jiang, G., Chang, C., Ting, J-M., Lee, H. L., & Tzeng, Y-H. (2011). Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. In 2011 11th IEEE International Conference on Nanotechnology, NANO 2011 (pp. 1367-1370). [6144477] https://doi.org/10.1109/NANO.2011.6144477
Chu, Yueh Chieh ; Jiang, Gerald ; Chang, Chi ; Ting, Jyh-Ming ; Lee, Hsin Le ; Tzeng, Yon-Hua. / Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. pp. 1367-1370
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title = "Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer",
abstract = "This paper reports on room-temperature high-density diamond seeding for low-temperature microwave plasma enhanced chemical vapor deposition of nanocrystalline diamond (NCD) on W/Si substrates. A tungsten layer acts as a diamond nucleation-enhancing layer. Formation of tungsten-carbide (WC) complex increases the initial nucleation density and plays an important role in facilitating diamond growth characteristics. Microwave plasma-enhanced chemical vapor deposition is applied to synthesize diamond films in Ar diluted by methane without hydrogen additives at low temperature. NCD seeding and film formation were investigated as a function of the thickness of tungsten interfacial layer. Raman spectroscopy, SEM, AFM and TEM were applied to characterize NCD films in order to gain insight into the initial stage of NCD diamond synthesis.",
author = "Chu, {Yueh Chieh} and Gerald Jiang and Chi Chang and Jyh-Ming Ting and Lee, {Hsin Le} and Yon-Hua Tzeng",
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Chu, YC, Jiang, G, Chang, C, Ting, J-M, Lee, HL & Tzeng, Y-H 2011, Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. in 2011 11th IEEE International Conference on Nanotechnology, NANO 2011., 6144477, pp. 1367-1370, 2011 11th IEEE International Conference on Nanotechnology, NANO 2011, Portland, OR, United States, 11-08-15. https://doi.org/10.1109/NANO.2011.6144477

Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. / Chu, Yueh Chieh; Jiang, Gerald; Chang, Chi; Ting, Jyh-Ming; Lee, Hsin Le; Tzeng, Yon-Hua.

2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1367-1370 6144477.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Chu YC, Jiang G, Chang C, Ting J-M, Lee HL, Tzeng Y-H. Room-temperature diamond seeding and microwave plasma enhanced CVD growth of nanodiamond with a tungsten interfacial layer. In 2011 11th IEEE International Conference on Nanotechnology, NANO 2011. 2011. p. 1367-1370. 6144477 https://doi.org/10.1109/NANO.2011.6144477