Ru/WCoCN as a seedless Cu barrier system for advanced Cu metallization

Dung Ching Perng, Jia Bin Yeh, Kuo Chung Hsu

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

The properties of Ru(5 nm)/WCoCN(5 nm) stacked layers as a seedless Cu barrier system has been investigated. Its barrier properties compared to single 10 nm Ru film were investigated by sheet resistances, X-ray diffraction patterns, transmission electron microscopy, energy dispersive spectrometry spot analysis, line scans, and leakage currents. Thermal stability of the Ru(5 nm)/WCoCN(5 nm) improved by over 100 °C than that of Ru(10 nm) barrier. The results show that Ru(5 nm)/WCoCN(5 nm) can effectively block Cu diffusion up to 600 °C for 30 min. The Ru(5 nm)/WCoCN(5 nm) bilayer is a great Cu barrier candidate for seedless Cu interconnects.

Original languageEnglish
Pages (from-to)688-692
Number of pages5
JournalApplied Surface Science
Volume256
Issue number3
DOIs
Publication statusPublished - 2009 Nov 15

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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