Selection of mold materials for electroforming of monolithic two-layer microstructure

C. K. Chung, C. J. Lin, L. H. Wu, Y. J. Fang, Y. Z. Hong

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

This paper reports the performance comparison of three kinds of thick photoresists (JSR THB-430 N, JSR THB-130 N, and SJR-5740) used as molds for electro-forming of monolithic two-layer microstructure with the nickel nozzle plate on SU8 chambers. The proper selection of mold material is strong relevant to the surface quality of mold and nozzle. The rough surface of mold is made of the JSR THB-430N with high viscosity while the smooth surface of mold is made of the JSR THB-130N with low viscosity. The positive tone SJR-5740 resist is not also a good material for the electroforming mold due to the dimension distortion after development. Good quality of monolithic two-layer microstructure has been achieved by JSR THB-130 N mold for electroforming due to the smooth mold surface, good dimension control and easily removal by acetone.

Original languageEnglish
Pages (from-to)467-471
Number of pages5
JournalMicrosystem Technologies
Volume10
Issue number6-7
DOIs
Publication statusPublished - 2004 Oct 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering

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