Selection of mold materials for electroforming of monolithic two-layer microstructure

C. K. Chung; C. J. Lin; L. H. Wu; Y. J. Fang; Y. Z. Hong

doi:10.1007/s00542-004-0372-9

Selection of mold materials for electroforming of monolithic two-layer microstructure

C. K. Chung, C. J. Lin, L. H. Wu, Y. J. Fang, Y. Z. Hong

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

This paper reports the performance comparison of three kinds of thick photoresists (JSR THB-430 N, JSR THB-130 N, and SJR-5740) used as molds for electro-forming of monolithic two-layer microstructure with the nickel nozzle plate on SU8 chambers. The proper selection of mold material is strong relevant to the surface quality of mold and nozzle. The rough surface of mold is made of the JSR THB-430N with high viscosity while the smooth surface of mold is made of the JSR THB-130N with low viscosity. The positive tone SJR-5740 resist is not also a good material for the electroforming mold due to the dimension distortion after development. Good quality of monolithic two-layer microstructure has been achieved by JSR THB-130 N mold for electroforming due to the smooth mold surface, good dimension control and easily removal by acetone.

Original language	English
Pages (from-to)	467-471
Number of pages	5
Journal	Microsystem Technologies
Volume	10
Issue number	6-7
DOIs	https://doi.org/10.1007/s00542-004-0372-9
Publication status	Published - 2004 Oct

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Hardware and Architecture
Electrical and Electronic Engineering

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10.1007/s00542-004-0372-9

Cite this

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title = "Selection of mold materials for electroforming of monolithic two-layer microstructure",

abstract = "This paper reports the performance comparison of three kinds of thick photoresists (JSR THB-430 N, JSR THB-130 N, and SJR-5740) used as molds for electro-forming of monolithic two-layer microstructure with the nickel nozzle plate on SU8 chambers. The proper selection of mold material is strong relevant to the surface quality of mold and nozzle. The rough surface of mold is made of the JSR THB-430N with high viscosity while the smooth surface of mold is made of the JSR THB-130N with low viscosity. The positive tone SJR-5740 resist is not also a good material for the electroforming mold due to the dimension distortion after development. Good quality of monolithic two-layer microstructure has been achieved by JSR THB-130 N mold for electroforming due to the smooth mold surface, good dimension control and easily removal by acetone.",

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AU - Chung, C. K.

AU - Lin, C. J.

AU - Wu, L. H.

AU - Fang, Y. J.

AU - Hong, Y. Z.

PY - 2004/10

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AB - This paper reports the performance comparison of three kinds of thick photoresists (JSR THB-430 N, JSR THB-130 N, and SJR-5740) used as molds for electro-forming of monolithic two-layer microstructure with the nickel nozzle plate on SU8 chambers. The proper selection of mold material is strong relevant to the surface quality of mold and nozzle. The rough surface of mold is made of the JSR THB-430N with high viscosity while the smooth surface of mold is made of the JSR THB-130N with low viscosity. The positive tone SJR-5740 resist is not also a good material for the electroforming mold due to the dimension distortion after development. Good quality of monolithic two-layer microstructure has been achieved by JSR THB-130 N mold for electroforming due to the smooth mold surface, good dimension control and easily removal by acetone.

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Selection of mold materials for electroforming of monolithic two-layer microstructure

Abstract

All Science Journal Classification (ASJC) codes

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