Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

Kun Tse Tu; Chen Kuei Chung

doi:10.1109/NEMS.2014.6908832

Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

Kun Tse Tu, Chen Kuei Chung

Department of Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO₄ laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO₄ laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO₄ beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.

Original language	English
Title of host publication	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	382-385
Number of pages	4
ISBN (Electronic)	9781479947270
DOIs	https://doi.org/10.1109/NEMS.2014.6908832
Publication status	Published - 2014 Sept 23
Event	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 - Waikiki Beach, United States Duration: 2014 Apr 13 → 2014 Apr 16

Publication series

Name	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

Other

Other	9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
Country/Territory	United States
City	Waikiki Beach
Period	14-04-13 → 14-04-16

All Science Journal Classification (ASJC) codes

Control and Systems Engineering
Electrical and Electronic Engineering

Access to Document

10.1109/NEMS.2014.6908832

Cite this

Tu, K. T., & Chung, C. K. (2014). Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 (pp. 382-385). Article 6908832 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NEMS.2014.6908832

Tu, Kun Tse ; Chung, Chen Kuei. / Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. pp. 382-385 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).

@inproceedings{aa7b71c0f66d49cf995e95835151f497,

title = "Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing",

abstract = "We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.",

author = "Tu, {Kun Tse} and Chung, {Chen Kuei}",

note = "Publisher Copyright: {\textcopyright} 2014 IEEE.; 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 ; Conference date: 13-04-2014 Through 16-04-2014",

year = "2014",

month = sep,

day = "23",

doi = "10.1109/NEMS.2014.6908832",

language = "English",

series = "9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "382--385",

booktitle = "9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014",

address = "United States",

}

Tu, KT & Chung, CK 2014, Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. in 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014., 6908832, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Institute of Electrical and Electronics Engineers Inc., pp. 382-385, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Waikiki Beach, United States, 14-04-13. https://doi.org/10.1109/NEMS.2014.6908832

Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. / Tu, Kun Tse; Chung, Chen Kuei.
9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. p. 382-385 6908832 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

TY - GEN

T1 - Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

AU - Tu, Kun Tse

AU - Chung, Chen Kuei

PY - 2014/9/23

Y1 - 2014/9/23

N2 - We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.

AB - We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.

UR - http://www.scopus.com/inward/record.url?scp=84908626114&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84908626114&partnerID=8YFLogxK

U2 - 10.1109/NEMS.2014.6908832

DO - 10.1109/NEMS.2014.6908832

M3 - Conference contribution

AN - SCOPUS:84908626114

T3 - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

SP - 382

EP - 385

BT - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

Y2 - 13 April 2014 through 16 April 2014

ER -

Tu KT, Chung CK. Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc. 2014. p. 382-385. 6908832. (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). doi: 10.1109/NEMS.2014.6908832

Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

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