Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing

Kun Tse Tu, Chen-Kuei Chung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.

Original languageEnglish
Title of host publication9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages382-385
Number of pages4
ISBN (Electronic)9781479947270
DOIs
Publication statusPublished - 2014 Sep 23
Event9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 - Waikiki Beach, United States
Duration: 2014 Apr 132014 Apr 16

Publication series

Name9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014

Other

Other9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014
CountryUnited States
CityWaikiki Beach
Period14-04-1314-04-16

Fingerprint

Tin oxides
Indium
Oxide films
Lasers
Electroforming
Processing
Thin films
Photolithography
Sputtering
Etching
Glass
Electrodes
Costs

All Science Journal Classification (ASJC) codes

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

Cite this

Tu, K. T., & Chung, C-K. (2014). Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014 (pp. 382-385). [6908832] (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/NEMS.2014.6908832
Tu, Kun Tse ; Chung, Chen-Kuei. / Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. pp. 382-385 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).
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abstract = "We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.",
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Tu, KT & Chung, C-K 2014, Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. in 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014., 6908832, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Institute of Electrical and Electronics Engineers Inc., pp. 382-385, 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014, Waikiki Beach, United States, 14-04-13. https://doi.org/10.1109/NEMS.2014.6908832

Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. / Tu, Kun Tse; Chung, Chen-Kuei.

9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc., 2014. p. 382-385 6908832 (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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N2 - We report the experimental and analysis results of micro parts processing using 1064 nm Nd:YVO4 laser direct-write micro patterning of indium tin oxide (ITO) thin films and then followed by electroforming on the patterns. Compared with conventional photolithographic and etching technologies, direct-write micro-patterns of ITO using Nd:YVO4 laser at proper control can achieve high quality of surface without requiring numerous processing steps. Using diffractive multiple Nd:YVO4 beam, the ITO thin film could be removed without any damage to the glass structure. After laser patterning, a high overlapping area of laser spot was used to pattern the electrode layer on film surface for obtaining a fine ablated edge profile. Accordingly, the micro parts can be obtained using electroforming and release process via laser-patterned ITO films. The new micro parts processing is a maskless, dry and low-cost process instead of the complex photolithography, sputtering and sacrificial layer.

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Tu KT, Chung C-K. Selective patterning of indium tin oxide films using 1064 nm laser for micro parts processing. In 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014. Institute of Electrical and Electronics Engineers Inc. 2014. p. 382-385. 6908832. (9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE-NEMS 2014). https://doi.org/10.1109/NEMS.2014.6908832