Self-assembled alternating nano-scaled layers

Wan Yu Wu, Jyh-Ming Ting

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper reports the use of a conventional sputter deposition technique to produce self-assembled alternating nano-scaled layers consisting of diamond-like carbon (DLC) and metal. A conventional sputter deposition technique produces alternating layers only when multiple sputtering targets are employed. However, we have successfully demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating nano-scaled layers through self-assembling. The microstructure of the alternating layers was examined as a function of the deposition parameters.

Original languageEnglish
Title of host publication2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
PublisherNano Science and Technology Institute
Pages448-451
Number of pages4
ISBN (Print)0972842276, 9780972842273
Publication statusPublished - 2004 Jan 1
Event2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004 - Boston, MA, United States
Duration: 2004 Mar 72004 Mar 11

Publication series

Name2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
Volume3

Other

Other2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004
CountryUnited States
CityBoston, MA
Period04-03-0704-03-11

Fingerprint

Sputter deposition
Sputtering
Diamonds
Microstructure
Carbon
Metals

All Science Journal Classification (ASJC) codes

  • Engineering(all)

Cite this

Wu, W. Y., & Ting, J-M. (2004). Self-assembled alternating nano-scaled layers. In 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004 (pp. 448-451). (2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004; Vol. 3). Nano Science and Technology Institute.
Wu, Wan Yu ; Ting, Jyh-Ming. / Self-assembled alternating nano-scaled layers. 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004. Nano Science and Technology Institute, 2004. pp. 448-451 (2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004).
@inproceedings{97d965f2077549eb8812313c3cb9cb9d,
title = "Self-assembled alternating nano-scaled layers",
abstract = "This paper reports the use of a conventional sputter deposition technique to produce self-assembled alternating nano-scaled layers consisting of diamond-like carbon (DLC) and metal. A conventional sputter deposition technique produces alternating layers only when multiple sputtering targets are employed. However, we have successfully demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating nano-scaled layers through self-assembling. The microstructure of the alternating layers was examined as a function of the deposition parameters.",
author = "Wu, {Wan Yu} and Jyh-Ming Ting",
year = "2004",
month = "1",
day = "1",
language = "English",
isbn = "0972842276",
series = "2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004",
publisher = "Nano Science and Technology Institute",
pages = "448--451",
booktitle = "2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004",

}

Wu, WY & Ting, J-M 2004, Self-assembled alternating nano-scaled layers. in 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004. 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004, vol. 3, Nano Science and Technology Institute, pp. 448-451, 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004, Boston, MA, United States, 04-03-07.

Self-assembled alternating nano-scaled layers. / Wu, Wan Yu; Ting, Jyh-Ming.

2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004. Nano Science and Technology Institute, 2004. p. 448-451 (2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004; Vol. 3).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - Self-assembled alternating nano-scaled layers

AU - Wu, Wan Yu

AU - Ting, Jyh-Ming

PY - 2004/1/1

Y1 - 2004/1/1

N2 - This paper reports the use of a conventional sputter deposition technique to produce self-assembled alternating nano-scaled layers consisting of diamond-like carbon (DLC) and metal. A conventional sputter deposition technique produces alternating layers only when multiple sputtering targets are employed. However, we have successfully demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating nano-scaled layers through self-assembling. The microstructure of the alternating layers was examined as a function of the deposition parameters.

AB - This paper reports the use of a conventional sputter deposition technique to produce self-assembled alternating nano-scaled layers consisting of diamond-like carbon (DLC) and metal. A conventional sputter deposition technique produces alternating layers only when multiple sputtering targets are employed. However, we have successfully demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating nano-scaled layers through self-assembling. The microstructure of the alternating layers was examined as a function of the deposition parameters.

UR - http://www.scopus.com/inward/record.url?scp=6344282527&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=6344282527&partnerID=8YFLogxK

M3 - Conference contribution

SN - 0972842276

SN - 9780972842273

T3 - 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004

SP - 448

EP - 451

BT - 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004

PB - Nano Science and Technology Institute

ER -

Wu WY, Ting J-M. Self-assembled alternating nano-scaled layers. In 2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004. Nano Science and Technology Institute. 2004. p. 448-451. (2004 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2004).