Self-assembled alternating nano-scaled layers of carbon and metal

Wan Yu Wu, Jyh-Ming Ting

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

Conventional sputter deposition techniques produce alternating layers only when multiple sputtering targets are employed. However, we have demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating layers through self-assembling. The periodicities of the layered structure range from 10 0 to 101 nm. The appearance of alternating nano-scaled layers and the periodicity depend on the type of the target materials and the deposition conditions. Based on the consideration of the deposition rate and the catalytic reaction of metal, the formation such self-assembled alternating nano-scaled layers is explained.

Original languageEnglish
Pages (from-to)312-315
Number of pages4
JournalChemical Physics Letters
Volume388
Issue number4-6
DOIs
Publication statusPublished - 2004 Apr 21

Fingerprint

Sputter deposition
Sputtering
Carbon
Metals
carbon
Deposition rates
metals
periodic variations
sputtering
assembling

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)
  • Physical and Theoretical Chemistry

Cite this

@article{99a0854dcb4444be99db79d1a6fc4d80,
title = "Self-assembled alternating nano-scaled layers of carbon and metal",
abstract = "Conventional sputter deposition techniques produce alternating layers only when multiple sputtering targets are employed. However, we have demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating layers through self-assembling. The periodicities of the layered structure range from 10 0 to 101 nm. The appearance of alternating nano-scaled layers and the periodicity depend on the type of the target materials and the deposition conditions. Based on the consideration of the deposition rate and the catalytic reaction of metal, the formation such self-assembled alternating nano-scaled layers is explained.",
author = "Wu, {Wan Yu} and Jyh-Ming Ting",
year = "2004",
month = "4",
day = "21",
doi = "10.1016/j.cplett.2004.03.004",
language = "English",
volume = "388",
pages = "312--315",
journal = "Chemical Physics Letters",
issn = "0009-2614",
publisher = "Elsevier",
number = "4-6",

}

Self-assembled alternating nano-scaled layers of carbon and metal. / Wu, Wan Yu; Ting, Jyh-Ming.

In: Chemical Physics Letters, Vol. 388, No. 4-6, 21.04.2004, p. 312-315.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Self-assembled alternating nano-scaled layers of carbon and metal

AU - Wu, Wan Yu

AU - Ting, Jyh-Ming

PY - 2004/4/21

Y1 - 2004/4/21

N2 - Conventional sputter deposition techniques produce alternating layers only when multiple sputtering targets are employed. However, we have demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating layers through self-assembling. The periodicities of the layered structure range from 10 0 to 101 nm. The appearance of alternating nano-scaled layers and the periodicity depend on the type of the target materials and the deposition conditions. Based on the consideration of the deposition rate and the catalytic reaction of metal, the formation such self-assembled alternating nano-scaled layers is explained.

AB - Conventional sputter deposition techniques produce alternating layers only when multiple sputtering targets are employed. However, we have demonstrated that the use of only one single sputtering gun in a conventional sputter deposition process could lead to the formation of alternating layers through self-assembling. The periodicities of the layered structure range from 10 0 to 101 nm. The appearance of alternating nano-scaled layers and the periodicity depend on the type of the target materials and the deposition conditions. Based on the consideration of the deposition rate and the catalytic reaction of metal, the formation such self-assembled alternating nano-scaled layers is explained.

UR - http://www.scopus.com/inward/record.url?scp=1842789010&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1842789010&partnerID=8YFLogxK

U2 - 10.1016/j.cplett.2004.03.004

DO - 10.1016/j.cplett.2004.03.004

M3 - Article

VL - 388

SP - 312

EP - 315

JO - Chemical Physics Letters

JF - Chemical Physics Letters

SN - 0009-2614

IS - 4-6

ER -