Self-assembled nano-scale multilayer formation using physical vapor deposition methods

C. Ronning, I. Gerhards, M. Seibt, H. Hofsäss, Wan Yu Wu, Jyh Ming Ting

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)


Self-assembled alternating carbon and metal layers have been produced by concurrent deposition of carbon and metal atoms using both dc reactive sputter deposition and mass selected ion beam deposition. High-resolution transmission electron micrographs clearly show the alternating metal-rich and -deficient layers with periodicities in the nanometer scale. The appearance of a multilayer structure and its periodicity strongly depend on the deposition parameters, i.e. the metal species, the provided stoichiometry and the ion energy. Here, we discuss the similarities and differences of the parameters used in both physical vapor deposition methods on the impact on the multilayer structures.

Original languageEnglish
Pages (from-to)261-264
Number of pages4
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Issue number1-2
Publication statusPublished - 2006 Jan 1

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • Instrumentation

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