This work involves as-prepared SiOx (x 2) films that were deposited by reactive sputtering. The regular Si/SiO2 superlattices were self-assembled without post-annealing. The periodicity of Si/SiO 2 superlattices was modulated by varying the oxygen flow rate and was associated with x in SiOx in the range 2-1.3. Si/SiO2 superlattices were formed under compressive stress and the factors that governed the periodicity were discussed.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)