Si diffusion in p-GaN

C. J. Pan, G. C. Chi, B. J. Pong, J. K. Sheu, J. Y. Chen

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

The characteristics of p-type Mg doped GaN films diffused with Si were studied. N-type conductivity was achieved, and the carrier mobility of diffused GaN was found to be 90-150 cm2 V-1s-1, which was higher than that of p-GaN but less than that of epitaxially grown n-GaN. It was found that the Mg acceptor states could become deep compensating defects, which could enable carrier transport dominated by electron hopping or diffusion. The results show that thermal annealing may induce defects at the surface, leading to an additional activation energy Ed∼10meV in the 200-500 K region in the diffused GaN.

Original languageEnglish
Pages (from-to)1727-1730
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume22
Issue number4
DOIs
Publication statusPublished - 2004 Jul 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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