SiGe resonant tunneling hot-carrier transistor

S. S. Rhee, G. K. Chang, T. K. Carns, K. L. Wang

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

Abstract

A SiGe three-terminal hot-hole transistor using a double-barrier resonant tunneling structure as an emitter is fabricated. Injected carriers from the emitter are transferred near-ballistically into the collector through a thin base. The demonstrated main feature of the device is a controllable negative differential resistance in the collector current. Utilizing the high-speed characteristics of the tunneling process and negative differential resistance, integration of the device into Si technology could find applications in the areas of high-speed digital circuits, frequency multipliers, and tunable oscillators/amplifiers.

Original languageEnglish
Pages (from-to)1061-1063
Number of pages3
JournalApplied Physics Letters
Volume56
Issue number11
DOIs
Publication statusPublished - 1990

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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