Silated acidic copolymers for nanoimprint lithography on flexible plastic substrates

Wen chang Liao, Steve Lien Chung Hsu, Jui Chen Lin

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A new silated acidic polymer was developed as the resist for nanoimprint lithography on flexible substrates. This polymer was synthesized from methylmethacrylate, n-butylacrylate, methacrylic acid and 3-[tris(trimethylsiloxy)silyl]propyl methacrylate by free radical copolymerization with an azobisisobutyronitrile (AIBN) initiator at 90 °C. The resist has excellent reactive ion etching (RIE) resistability, a lower Tg (43 °C) compared to poly(methyl methacrylate) (PMMA) and good flowability. It is suitable to use on flexible plastic substrates. The resist can be easily removed by an aqueous base solution at the final stripping step, instead of using an organic solvent or RIE. A 100 nm/50 nm (line/space) feature pattern was obtained on a flexible polyethylene terephthalate (PET)/ITO substrate.

Original languageEnglish
Pages (from-to)129-135
Number of pages7
JournalMicroelectronic Engineering
Volume84
Issue number1
DOIs
Publication statusPublished - 2007 Jan 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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