Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property

Chun Tse Wu, Yao Li Liu, Po Yen Lai, Shih Hung Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO:A and T 2023
PublisherOptical Society of America
ISBN (Electronic)9781957171258
DOIs
Publication statusPublished - 2023
EventCLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023 - San Jose, United States
Duration: 2023 May 72023 May 12

Publication series

NameCLEO: Applications and Technology, CLEO:A and T 2023

Conference

ConferenceCLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023
Country/TerritoryUnited States
CitySan Jose
Period23-05-0723-05-12

All Science Journal Classification (ASJC) codes

  • General Computer Science
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Space and Planetary Science
  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Instrumentation

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