TY - GEN
T1 - Simulation Framework of Laser Produced Tin Plasma Extreme Ultraviolet Light Emission Based on Quasi-Steady State Approach of Plasma Radiative Property
AU - Wu, Chun Tse
AU - Liu, Yao Li
AU - Lai, Po Yen
AU - Chen, Shih Hung
N1 - Publisher Copyright:
CLEO 2023 © Optica Publishing Group 2023, © 2023 The Author(s)
PY - 2023
Y1 - 2023
N2 - Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.
AB - Enhancement of EUV emission from laser-produced plasma is a crucial issue for semiconductor manufacturing. One-dimensional simulation framework is developed with quasi-equilibrium assumption, which saves computational cost and has qualitative agreement with experiments.
UR - http://www.scopus.com/inward/record.url?scp=85191440771&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85191440771&partnerID=8YFLogxK
U2 - 10.1364/CLEO_AT.2023.JTu2A.12
DO - 10.1364/CLEO_AT.2023.JTu2A.12
M3 - Conference contribution
AN - SCOPUS:85191436482
T3 - CLEO: Applications and Technology, CLEO:A and T 2023
BT - CLEO
PB - Optical Society of America
T2 - CLEO: Applications and Technology, CLEO:A and T 2023 - Part of Conference on Lasers and Electro-Optics 2023
Y2 - 7 May 2023 through 12 May 2023
ER -