Single-domain Si (110) -16×2 surface fabricated by electromigration

Yoichi Yamada, Antoine Girard, Hidehito Asaoka, Hiroyuki Yamamoto, Shin Ichi Shamoto

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)

Abstract

Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.

Original languageEnglish
Article number153309
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume76
Issue number15
DOIs
Publication statusPublished - 2007 Oct 23

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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