Single-domain Si (110) -16×2 surface fabricated by electromigration

Yoichi Yamada; Antoine Girard; Hidehito Asaoka; Hiroyuki Yamamoto; Shin Ichi Shamoto

doi:10.1103/PhysRevB.76.153309

Single-domain Si (110) -16×2 surface fabricated by electromigration

Yoichi Yamada
, Antoine Girard
, Hidehito Asaoka
, Hiroyuki Yamamoto
, Shin Ichi Shamoto

Department of Physics

Research output: Contribution to journal › Article › peer-review

30 Citations (Scopus)

Abstract

Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.

Original language	English
Article number	153309
Journal	Physical Review B - Condensed Matter and Materials Physics
Volume	76
Issue number	15
DOIs	https://doi.org/10.1103/PhysRevB.76.153309
Publication status	Published - 2007 Oct 23

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1103/PhysRevB.76.153309

Cite this

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abstract = "Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.",

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AU - Yamada, Yoichi

AU - Girard, Antoine

AU - Asaoka, Hidehito

AU - Yamamoto, Hiroyuki

AU - Shamoto, Shin Ichi

PY - 2007/10/23

Y1 - 2007/10/23

N2 - Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.

AB - Micrometer-wide single domain of Si (110) -16×2 reconstruction has been fabricated by means of controlled electromigration of surface atoms. The electromigration effect in dc heating process is found to line up the reconstruction rows when the current direction matches the orientation of the rows. This finding provides not only a well-controlled surface preparation method for Si(110) but also another template for low-dimensional nanostructures.

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JF - Physical Review B - Condensed Matter and Materials Physics

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ER -

Single-domain Si (110) -16×2 surface fabricated by electromigration

Abstract

All Science Journal Classification (ASJC) codes

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