Single-step fabrication of potassium tantalate films by hydrothermal-electrochemical method at lower temperatures

Potassium tantalate thin films (KT) were hydrothermal-electrochemically and electrochemically synthesized on tantalum substrates under galvanostatic conditions in KOH solutions at temperatures from 50 to 150 °C. The pyrochlore structures were characterized by x-ray diffraction and scanning electron microscopy for the films formed under a variety of conditions. It was found that the reaction temperature, potassium hydroxide concentration, and current density significantly affect the formation and the morphology of the KT films. When the reaction temperatures were higher than 80 °C and the KOH concentrations were greater than 2.0 M, very crystalline films with excellent film flatness and good adherence on the substrate were obtained. Based on the experimental results, it was confirmed that the formation and growth of KT films by the hydrothermal-electrochemical and electrochemical method follow a dissolution-crystallization mechanism.