TY - JOUR
T1 - Solid immersion interference lithography with conformable phase mask
AU - Lin, Chun Hung
AU - Lin, Yu Chu
AU - Liang, Chia Ching
N1 - Funding Information:
This study was supported by the National Science Council of Taiwan under grants NSC 98-2221-E-006-018- and NSC 99-2120-M-009-004- . We thank Mr. Hsien-Ting Chen for performing the reflectance and transmittance measurement of PFPE and National Nano Device Laboratories for providing equipment and technical support.
PY - 2014/7/1
Y1 - 2014/7/1
N2 - This study proposes a simple and cost-effective method of solid immersion interference lithography that uses a conformable phase mask. Perfluoropolyether based polymer was used as the material of the elastomeric phase mask. The proposed method requires no liquid layer to function as the coupling medium or the index matching layer and keeps the photoresist free from the contamination of liquid. The solid coupling medium improves the resolution of interference fringes by a factor of its refractive index. This study presents an exposed interference fringe with a half-pitch of 58 nm using a He-Cd laser with λ = 325 nm, which corresponds to a feature size of λ/5.6.
AB - This study proposes a simple and cost-effective method of solid immersion interference lithography that uses a conformable phase mask. Perfluoropolyether based polymer was used as the material of the elastomeric phase mask. The proposed method requires no liquid layer to function as the coupling medium or the index matching layer and keeps the photoresist free from the contamination of liquid. The solid coupling medium improves the resolution of interference fringes by a factor of its refractive index. This study presents an exposed interference fringe with a half-pitch of 58 nm using a He-Cd laser with λ = 325 nm, which corresponds to a feature size of λ/5.6.
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U2 - 10.1016/j.mee.2014.07.005
DO - 10.1016/j.mee.2014.07.005
M3 - Article
AN - SCOPUS:84905569886
SN - 0167-9317
VL - 123
SP - 136
EP - 139
JO - Microelectronic Engineering
JF - Microelectronic Engineering
ER -