Solid immersion interference lithography with conformable phase mask

Chun Hung Lin, Yu Chu Lin, Chia Ching Liang

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

This study proposes a simple and cost-effective method of solid immersion interference lithography that uses a conformable phase mask. Perfluoropolyether based polymer was used as the material of the elastomeric phase mask. The proposed method requires no liquid layer to function as the coupling medium or the index matching layer and keeps the photoresist free from the contamination of liquid. The solid coupling medium improves the resolution of interference fringes by a factor of its refractive index. This study presents an exposed interference fringe with a half-pitch of 58 nm using a He-Cd laser with λ = 325 nm, which corresponds to a feature size of λ/5.6.

Original languageEnglish
Pages (from-to)136-139
Number of pages4
JournalMicroelectronic Engineering
Volume123
DOIs
Publication statusPublished - 2014 Jul 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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