Spiral hollow cathode plasma-assisted diamond deposition

Y. Tzeng; P. J. Kung; R. Zee; K. Legg; H. Solnick-Legg; D. Burns; B. H. Loo

doi:10.1063/1.100268

Spiral hollow cathode plasma-assisted diamond deposition

Y. Tzeng, P. J. Kung, R. Zee, K. Legg, H. Solnick-Legg, D. Burns, B. H. Loo

Institute of Microelectronics

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

High quality diamond films have been deposited on silicon and sapphire by means of a combined hot filament/electron beam/plasma-assisted chemical vapor deposition technique. A spiral tantalum foil is used as the hot cathode to generate a high-current dc discharge at a low sustaining voltage. Gas mixtures consisting of methane, hydrogen, and argon flowing through the spiral cathode towards the anode are effectively decomposed by the hot cathode and the high-density plasma. Diamond particles and films, grown at a rate between 0.5 and 5 μm/h, have been characterized by scanning electron microscopy, x-ray diffraction, and Raman spectroscopy.

Original language	English
Pages (from-to)	2326-2327
Number of pages	2
Journal	Applied Physics Letters
Volume	53
Issue number	23
DOIs	https://doi.org/10.1063/1.100268
Publication status	Published - 1988

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.100268

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AU - Tzeng, Y.

AU - Kung, P. J.

AU - Zee, R.

AU - Legg, K.

AU - Solnick-Legg, H.

AU - Burns, D.

AU - Loo, B. H.

PY - 1988

Y1 - 1988

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AB - High quality diamond films have been deposited on silicon and sapphire by means of a combined hot filament/electron beam/plasma-assisted chemical vapor deposition technique. A spiral tantalum foil is used as the hot cathode to generate a high-current dc discharge at a low sustaining voltage. Gas mixtures consisting of methane, hydrogen, and argon flowing through the spiral cathode towards the anode are effectively decomposed by the hot cathode and the high-density plasma. Diamond particles and films, grown at a rate between 0.5 and 5 μm/h, have been characterized by scanning electron microscopy, x-ray diffraction, and Raman spectroscopy.

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Spiral hollow cathode plasma-assisted diamond deposition

Abstract

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