Stability improvement of nitrogen doping on IgO TFTs under positive gate bias stress and hysteresis test

Yen Chi Cheng, Sheng-Po Chang, Shoou-Jinn Chang, Tien Hung Cheng, Yen Lin Tsai, Yu Zung Chiou, Lucent Lu

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Thin-film transistors (TFTs) using indium-gallium-oxide (IGO) semiconductor materials as channel layers were fabricated. In this study, nitrogen was introduced in the process of channel deposition to investigate its effect on device performance. The experimental results showed that moderate nitrogen doping can significantly improve the device stability under positive gate bias stress owing to the reduction of oxygen vacancies. Furthermore, for the purpose of understanding the influence of different doping levels, the nitrogen doping ratio was modulated in ascending order from 0 sccm to 5 sccm. Among the fabricated c-IGO TFTs, the one with 2 sccm nitrogen doping exhibited the least threshold voltage shift. In addition, the hysteresis measurement further confirmed that the interface traps between the channel and the dielectric were significantly passivated in nitrogen-doped TFT. In this regard, the method of in-situ nitrogen doping was certified to serve an efficient way of fabricating a passivation-free TFT and improve the device stability simultaneously.

Original languageEnglish
Pages (from-to)Q3034-Q3040
JournalECS Journal of Solid State Science and Technology
Volume8
Issue number7
DOIs
Publication statusPublished - 2019 Jan 1

Fingerprint

Gates (transistor)
Thin film transistors
Hysteresis
Nitrogen
Doping (additives)
Indium
Gallium
Oxygen vacancies
Threshold voltage
Passivation
Oxide films
IgO
Semiconductor materials

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Cite this

Cheng, Yen Chi ; Chang, Sheng-Po ; Chang, Shoou-Jinn ; Cheng, Tien Hung ; Tsai, Yen Lin ; Chiou, Yu Zung ; Lu, Lucent. / Stability improvement of nitrogen doping on IgO TFTs under positive gate bias stress and hysteresis test. In: ECS Journal of Solid State Science and Technology. 2019 ; Vol. 8, No. 7. pp. Q3034-Q3040.
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Stability improvement of nitrogen doping on IgO TFTs under positive gate bias stress and hysteresis test. / Cheng, Yen Chi; Chang, Sheng-Po; Chang, Shoou-Jinn; Cheng, Tien Hung; Tsai, Yen Lin; Chiou, Yu Zung; Lu, Lucent.

In: ECS Journal of Solid State Science and Technology, Vol. 8, No. 7, 01.01.2019, p. Q3034-Q3040.

Research output: Contribution to journalArticle

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AU - Cheng, Yen Chi

AU - Chang, Sheng-Po

AU - Chang, Shoou-Jinn

AU - Cheng, Tien Hung

AU - Tsai, Yen Lin

AU - Chiou, Yu Zung

AU - Lu, Lucent

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