Strain in epitaxial CoSi2 films on Si (111) and inference for pseudomorphic growth

Gang Bai, Marc A. Nicolet, Thad Vreeland, Q. Ye, K. L. Wang

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13 Citations (Scopus)

Abstract

The perpendicular x-ray strain of epitaxial CoSi2 films grown on Si(111) substrates at ∼600°C was measured at temperatures from 24 up to 650°C. At 600°C, the perpendicular x-ray strain is -0.86%, which is about the x-ray strain that a stress-free CoSi2 film on Si(111) would have at that temperature. This result shows that the stress in the epitaxial CoSi2 film is fully relaxed at the growth temperature. Strains in the film below the growth temperature are induced by the difference in the thermal expansion coefficient of CoSi2 and Si, αf- αs=0.65×10-5/°C. Within experimental error margins, the strain increases linearly with decreasing temperature at a rate of (1.3±0.1)×10-5/C. The slope of the strain-temperature dependence, obtained by assuming that the density of misfit dislocations formed at the growth temperature remains unchanged, agrees with the measured slope if the unknown Poisson ratio of CoSi2 is assumed to be νf=1/3. These observations support three rules postulated for epitaxial growth.

Original languageEnglish
Pages (from-to)1874-1876
Number of pages3
JournalApplied Physics Letters
Volume55
Issue number18
DOIs
Publication statusPublished - 1989

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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