Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature

Zhang Song, Tiphaine Bourgeteau, Itaru Raifuku, Yvan Bonnassieux, Erik Johnson, Yasuaki Ishikawa, Martin Foldyna, Pere Roca i Cabarrocas, Yukiharu Uraoka

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4 Citations (Scopus)

Abstract

Structure and crystal growth of nickel oxide thin films (10–300 nm) prepared by low-temperature sputtering have been investigated by scanning electron microscopy (SEM), X-ray diffraction, and spectroscopic ellipsometry. Very thin films are compact and homogeneous and are made of almost randomly oriented crystals. A preferential growth direction is then observed following the (111), (220) and (311) planes to the detriment of the (222) and (200) planes, inducing a growth of the materials in columns perpendicularly to the substrate. An optical model able to account for this particular structure has been created from the spectroscopic ellipsometry measurements, and correlates well with the structure observed by SEM. Moreover, it enables an accurate estimation of the thickness without damage to the substrate.

Original languageEnglish
Pages (from-to)209-215
Number of pages7
JournalThin Solid Films
Volume646
DOIs
Publication statusPublished - 2018 Jan 31

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Song, Z., Bourgeteau, T., Raifuku, I., Bonnassieux, Y., Johnson, E., Ishikawa, Y., Foldyna, M., i Cabarrocas, P. R., & Uraoka, Y. (2018). Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature. Thin Solid Films, 646, 209-215. https://doi.org/10.1016/j.tsf.2017.12.003