Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature

Zhang Song, Tiphaine Bourgeteau, Itaru Raifuku, Yvan Bonnassieux, Erik Johnson, Yasuaki Ishikawa, Martin Foldyna, Pere Roca i Cabarrocas, Yukiharu Uraoka

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Structure and crystal growth of nickel oxide thin films (10–300 nm) prepared by low-temperature sputtering have been investigated by scanning electron microscopy (SEM), X-ray diffraction, and spectroscopic ellipsometry. Very thin films are compact and homogeneous and are made of almost randomly oriented crystals. A preferential growth direction is then observed following the (111), (220) and (311) planes to the detriment of the (222) and (200) planes, inducing a growth of the materials in columns perpendicularly to the substrate. An optical model able to account for this particular structure has been created from the spectroscopic ellipsometry measurements, and correlates well with the structure observed by SEM. Moreover, it enables an accurate estimation of the thickness without damage to the substrate.

Original languageEnglish
Pages (from-to)209-215
Number of pages7
JournalThin Solid Films
Volume646
DOIs
Publication statusPublished - 2018 Jan 31

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Spectroscopic ellipsometry
Sputtering
radio frequencies
sputtering
Thin films
Scanning electron microscopy
Nickel oxide
ellipsometry
Substrates
thin films
Crystallization
Crystal growth
Oxide films
scanning electron microscopy
nickel oxides
X ray diffraction
Temperature
Crystals
crystal growth
damage

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Song, Z., Bourgeteau, T., Raifuku, I., Bonnassieux, Y., Johnson, E., Ishikawa, Y., ... Uraoka, Y. (2018). Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature. Thin Solid Films, 646, 209-215. https://doi.org/10.1016/j.tsf.2017.12.003
Song, Zhang ; Bourgeteau, Tiphaine ; Raifuku, Itaru ; Bonnassieux, Yvan ; Johnson, Erik ; Ishikawa, Yasuaki ; Foldyna, Martin ; i Cabarrocas, Pere Roca ; Uraoka, Yukiharu. / Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature. In: Thin Solid Films. 2018 ; Vol. 646. pp. 209-215.
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Song, Z, Bourgeteau, T, Raifuku, I, Bonnassieux, Y, Johnson, E, Ishikawa, Y, Foldyna, M, i Cabarrocas, PR & Uraoka, Y 2018, 'Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature', Thin Solid Films, vol. 646, pp. 209-215. https://doi.org/10.1016/j.tsf.2017.12.003

Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature. / Song, Zhang; Bourgeteau, Tiphaine; Raifuku, Itaru; Bonnassieux, Yvan; Johnson, Erik; Ishikawa, Yasuaki; Foldyna, Martin; i Cabarrocas, Pere Roca; Uraoka, Yukiharu.

In: Thin Solid Films, Vol. 646, 31.01.2018, p. 209-215.

Research output: Contribution to journalArticle

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AU - Johnson, Erik

AU - Ishikawa, Yasuaki

AU - Foldyna, Martin

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AU - Uraoka, Yukiharu

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