Structure and electrical properties of MgTiO₃ thin films deposited by rf magnetron sputtering

Engineering & Materials Science

• Atomic force microscopy 31%
• Electric properties 79%
• Magnetron sputtering 100%
• Microstructure 16%
• Scanning electron microscopy 19%
• Sintering 23%
• Substrates 52%
• Surface morphology 28%
• Temperature 30%
• Thin films 70%
• X ray diffraction 24%

Chemical Compounds

• Atomic Force Microscopy 29%
• Electrical Property 63%
• Grain Size 35%
• Liquid Film 36%
• Magnetron Sputtering 86%
• Microstructure 25%
• Scanning Electron Microscopy 22%
• Sintering 31%
• Surface 11%
• X-Ray Diffraction 18%

Physics & Astronomy

• atomic force microscopy 19%
• diffraction 13%
• electrical properties 55%
• fabrication 15%
• grain size 18%
• magnetron sputtering 62%
• microstructure 14%
• radiant flux density 45%
• scanning electron microscopy 16%
• sintering 19%
• temperature 22%
• thin films 38%
• x rays 11%