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Study of electromigration-induced failures on Cu pillar bumps joined to OSP and ENEPIG substrates
Yu Hsiang Hsiao
,
Kwang-Lung Lin
, Chiu Wen Lee
, Yu Hsiu Shao
, Yi Shao Lai
Department of Materials Science and Engineering
International Curriculum for Advanced Materials Program
Research output
:
Contribution to journal
›
Article
›
peer-review
9
Citations (Scopus)
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Dive into the research topics of 'Study of electromigration-induced failures on Cu pillar bumps joined to OSP and ENEPIG substrates'. Together they form a unique fingerprint.
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Keyphrases
Bump
100%
Electromigration
100%
ENEPIG
100%
Organic Solderability Preservatives
100%
Cu pillar Bump
100%
Induced Failures
100%
Cu6Sn5
57%
Cu Pad
42%
Gap Formation
42%
Failure Mode
28%
Cu Substrate
28%
Atomic Flux
28%
Chemical Potential
14%
Electroless Ni-P
14%
Void Growth
14%
Current Stressing
14%
Stress Conditions
14%
Barrier Layer
14%
Compound Layer
14%
Ni-P Electroless
14%
Joint Interface
14%
Interfacial Intermetallic Compound
14%
Under Bump Metallurgy
14%
Work Study
14%
Strong Resistance
14%
Material Science
Solderability
100%
Cathode
50%
Metallurgy
16%
Chemical Engineering
Chemical Potential
100%
Engineering
Joint Interface
25%