Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

Kuo Tsai Wu; Sheng Jye Hwang; Huei Huang Lee

doi:10.3390/app9194110

Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

Kuo Tsai Wu, Sheng Jye Hwang, Huei Huang Lee

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

Original language	English
Article number	4110
Journal	Applied Sciences (Switzerland)
Volume	9
Issue number	19
DOIs	https://doi.org/10.3390/app9194110
Publication status	Published - 2019 Oct 1

All Science Journal Classification (ASJC) codes

General Materials Science
Instrumentation
General Engineering
Process Chemistry and Technology
Computer Science Applications
Fluid Flow and Transfer Processes

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10.3390/app9194110

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title = "Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses",

abstract = "Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.",

author = "Wu, {Kuo Tsai} and Hwang, {Sheng Jye} and Lee, {Huei Huang}",

note = "Funding Information: The work is supported by Contrel Technology Co., Ltd. and the project title is {"}Wafer level camera UV curing high precision imprint exposure machine development plan{"}.This research received no external funding Publisher Copyright: {\textcopyright} 2019 by the authors.",

year = "2019",

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doi = "10.3390/app9194110",

language = "English",

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journal = "Applied Sciences (Switzerland)",

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AU - Wu, Kuo Tsai

AU - Hwang, Sheng Jye

AU - Lee, Huei Huang

N1 - Funding Information: The work is supported by Contrel Technology Co., Ltd. and the project title is "Wafer level camera UV curing high precision imprint exposure machine development plan".This research received no external funding Publisher Copyright: © 2019 by the authors.

PY - 2019/10/1

Y1 - 2019/10/1

N2 - Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

AB - Wafer-level camera lenses are a very promising process for camera lens fabrication. However, there exist some problems with this technology, such as uneven exposure due to curing non-uniformities. In this study, an optical simulation was implemented to simulate the UV light-emitting diodes (LEDs) curing process. We design the LED arrangement, and then find the corresponding LED and adjust the LED power to improve exposure uniformity. The simulation results are very close to the experimental data, and the uniformity is also within the standard range.

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Study of exposure uniformity of UV LED exposure system for wafer-level camera lenses

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All Science Journal Classification (ASJC) codes

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