@article{9456735b87c943e0a17f4afad7df3445,
title = "Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions",
abstract = "The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness.",
author = "Chen, {Cheng Shi} and Liu, {Chuan Pu} and Tsao, {C. Y.A.} and Yang, {Heng Ghieh}",
note = "Funding Information: The work is supported by NSC, Taiwan under the project number of NSC89-2218-E006-153. We are also grateful for the use of the sputter equipment in the Semiconductor Lab, which is supported and maintained by the Department of Materials Science and Engineering at National Cheng-Kung University, Taiwan. Additionally, the authors wish to thanks Dr. Y.G. Lee, H.L. Chen and Y.Z. Lin for helpful discussions.",
year = "2004",
month = jul,
day = "1",
doi = "10.1016/j.scriptamat.2004.06.005",
language = "English",
volume = "51",
pages = "715--719",
journal = "Scripta Materialia",
issn = "1359-6462",
publisher = "Elsevier Limited",
number = "7",
}