Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions

Cheng Shi Chen; Chuan-Pu Liu; C. Y.A. Tsao; Heng Ghieh Yang

doi:10.1016/j.scriptamat.2004.06.005

Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions

Cheng Shi Chen, Chuan-Pu Liu, C. Y.A. Tsao, Heng Ghieh Yang

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness.

Original language	English
Pages (from-to)	715-719
Number of pages	5
Journal	Scripta Materialia
Volume	51
Issue number	7
DOIs	https://doi.org/10.1016/j.scriptamat.2004.06.005
Publication status	Published - 2004 Jul 1

All Science Journal Classification (ASJC) codes

Materials Science(all)
Condensed Matter Physics

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title = "Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions",

abstract = "The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness.",

author = "Chen, {Cheng Shi} and Chuan-Pu Liu and Tsao, {C. Y.A.} and Yang, {Heng Ghieh}",

year = "2004",

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AU - Liu, Chuan-Pu

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AU - Yang, Heng Ghieh

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