Study of mechanical properties of PVD ZrN films, deposited under positive and negative substrate bias conditions

Cheng Shi Chen, Chuan-Pu Liu, C. Y.A. Tsao, Heng Ghieh Yang

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

The ZrN films were grown on Si substrates using dc magnetron sputtering where the substrate bias is varied from -45 to 50 V. The positive substrate bias increases in hardness and elastic modulus, while negative bias enhances hardness and toughness.

Original languageEnglish
Pages (from-to)715-719
Number of pages5
JournalScripta Materialia
Volume51
Issue number7
DOIs
Publication statusPublished - 2004 Jul 1

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics

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