Study of preferred orientation of zinc oxide films on the 64° LiNbO3 substrates and their applications as liquid sensors

Shiou Jen Jian; Sheng Yuan Chu; Tung Yi Huang; Walter Water

doi:10.1116/1.1809125

Study of preferred orientation of zinc oxide films on the 64° LiNbO₃ substrates and their applications as liquid sensors

Shiou Jen Jian, Sheng Yuan Chu, Tung Yi Huang, Walter Water

Department of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The growth of (002) orientation of zinc oxide (ZnO) films on 64° LiNbO₃ substrates using rf magnetron sputtering system was demonstrated. It was shown that the film orientations and crystallinity were strongly dependent on the rf power, total chamber pressure, ratio of argon to oxygen and substrate temperature. The crystalline structure of the films was investigated using X-ray diffraction and scanning electron microscopy. It was demonstrated that the highly oriented (002) films were obtained under a total chamber pressure of 1.33 Pa, containing 40% oxygen and 60% argon and a substrate temperature around 120°C.

Original language	English
Pages (from-to)	2424-2430
Number of pages	7
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	22
Issue number	6
DOIs	https://doi.org/10.1116/1.1809125
Publication status	Published - 2004 Nov

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.1809125

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title = "Study of preferred orientation of zinc oxide films on the 64° LiNbO3 substrates and their applications as liquid sensors",

abstract = "The growth of (002) orientation of zinc oxide (ZnO) films on 64° LiNbO3 substrates using rf magnetron sputtering system was demonstrated. It was shown that the film orientations and crystallinity were strongly dependent on the rf power, total chamber pressure, ratio of argon to oxygen and substrate temperature. The crystalline structure of the films was investigated using X-ray diffraction and scanning electron microscopy. It was demonstrated that the highly oriented (002) films were obtained under a total chamber pressure of 1.33 Pa, containing 40% oxygen and 60% argon and a substrate temperature around 120°C.",

author = "Jian, {Shiou Jen} and Chu, {Sheng Yuan} and Huang, {Tung Yi} and Walter Water",

note = "Funding Information: The National Science Council of Republic of China supported this research, under Grant No. NSC93-2216-E-006-033. The authors also acknowledge the supports from Center for Micro-Nano Technology, National Cheng-Kung University. ",

year = "2004",

month = nov,

doi = "10.1116/1.1809125",

language = "English",

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pages = "2424--2430",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

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TY - JOUR

T1 - Study of preferred orientation of zinc oxide films on the 64° LiNbO3 substrates and their applications as liquid sensors

AU - Jian, Shiou Jen

AU - Chu, Sheng Yuan

AU - Huang, Tung Yi

AU - Water, Walter

N1 - Funding Information: The National Science Council of Republic of China supported this research, under Grant No. NSC93-2216-E-006-033. The authors also acknowledge the supports from Center for Micro-Nano Technology, National Cheng-Kung University.

PY - 2004/11

Y1 - 2004/11

N2 - The growth of (002) orientation of zinc oxide (ZnO) films on 64° LiNbO3 substrates using rf magnetron sputtering system was demonstrated. It was shown that the film orientations and crystallinity were strongly dependent on the rf power, total chamber pressure, ratio of argon to oxygen and substrate temperature. The crystalline structure of the films was investigated using X-ray diffraction and scanning electron microscopy. It was demonstrated that the highly oriented (002) films were obtained under a total chamber pressure of 1.33 Pa, containing 40% oxygen and 60% argon and a substrate temperature around 120°C.

AB - The growth of (002) orientation of zinc oxide (ZnO) films on 64° LiNbO3 substrates using rf magnetron sputtering system was demonstrated. It was shown that the film orientations and crystallinity were strongly dependent on the rf power, total chamber pressure, ratio of argon to oxygen and substrate temperature. The crystalline structure of the films was investigated using X-ray diffraction and scanning electron microscopy. It was demonstrated that the highly oriented (002) films were obtained under a total chamber pressure of 1.33 Pa, containing 40% oxygen and 60% argon and a substrate temperature around 120°C.

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Study of preferred orientation of zinc oxide films on the 64° LiNbO₃ substrates and their applications as liquid sensors

Abstract

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