Study of surface reactions and intermediates of ICH2CH 2OH and ClCH2CH2OH on oxygen-precovered Cu(1 0 0)

Pei Teng Chang, Kuan Hung Kuo, Jian Jung Shih, Chia Yuan Chen, Jong Liang Lin

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

ICH2CH2OH decomposes into an oxametallacycle (-CH2CH2O-) upon its adsorption on oxygen-precovered Cu(100) (O/Cu(100)) at 115 K. -CH2CH2O- on O/Cu(100) reacts mainly to form C2H4 and CH3CHO. ClCH2CH2OH dissociates on O/Cu(100) to generate ClCH 2CH2O-, instead of -CH2CH2O-, between 170 and 210 K. ClCH2CH2O- reacts on the surface to form C2H4 and CH3CHO. In addition, ClCHCH 2 is also generated, probably from ClCH2CH2OH or ClCH2CH2O-. No ClCH2CHO desorption is observed in contrast to the case of FCH2CH2O- which reacts to form FCH2CHO. Clearly, the carbon-halogen bond strength has a profound effect on the decomposition pathway of 2-haloethanol.

Original languageEnglish
Pages (from-to)208-214
Number of pages7
JournalSurface Science
Volume561
Issue number2-3
DOIs
Publication statusPublished - 2004 Jul 20

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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