Abstract
ICH2CH2OH decomposes into an oxametallacycle (-CH2CH2O-) upon its adsorption on oxygen-precovered Cu(100) (O/Cu(100)) at 115 K. -CH2CH2O- on O/Cu(100) reacts mainly to form C2H4 and CH3CHO. ClCH2CH2OH dissociates on O/Cu(100) to generate ClCH 2CH2O-, instead of -CH2CH2O-, between 170 and 210 K. ClCH2CH2O- reacts on the surface to form C2H4 and CH3CHO. In addition, ClCHCH 2 is also generated, probably from ClCH2CH2OH or ClCH2CH2O-. No ClCH2CHO desorption is observed in contrast to the case of FCH2CH2O- which reacts to form FCH2CHO. Clearly, the carbon-halogen bond strength has a profound effect on the decomposition pathway of 2-haloethanol.
Original language | English |
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Pages (from-to) | 208-214 |
Number of pages | 7 |
Journal | Surface Science |
Volume | 561 |
Issue number | 2-3 |
DOIs | |
Publication status | Published - 2004 Jul 20 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry