Study of textured ZnO:Al thin film and its optical properties for thin film silicon solar cells

Wei Lun Lu, Kuo Chan Huang, Pin Kun Hung, Mau Phon Houng

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

The study addresses the optical properties and morphologies of Al-doped ZnO (AZO) films textured by the chemical wet-etching method using three different acid solutions: HCl, HNO3, and H3PO4. An initial AZO film was sputtered on a glass substrate by rf magnetron sputtering. The film surface was then textured by wet-etching using diluted HCl, HNO 3, or H3PO4. The average transmittance of all the post-treated ZnO:Al films remains around 7580% as measured by a UVvis analyzer. A haze ratio calculation shows that the light scattering properties can be significantly controlled by varying the etchant species, acid concentration, and etching time. Further, the HNO3 etchant gives the highest haze ratio of 43.0% at a wavelength of 550 nm. Compared with solar cells deposited on non-textured ZnO:Al films, a significant enhancement in the short-circuit current density of 17.8% for the a-Si solar cells with textured ZnO:Al films was achieved.

Original languageEnglish
Pages (from-to)52-56
Number of pages5
JournalJournal of Physics and Chemistry of Solids
Volume73
Issue number1
DOIs
Publication statusPublished - 2012 Jan

All Science Journal Classification (ASJC) codes

  • General Chemistry
  • General Materials Science
  • Condensed Matter Physics

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