Study of the surface oxidation epitaxy of pure Ni

Z. Lockman, X. Qi, A. Berenov, W. Goldacker, R. Nast, B. DeBoer, B. Holpfapzel, J. L. MacManus-Driscoll

Research output: Contribution to journalConference articlepeer-review


The growth of nickel oxide (NiO) on {100}<001> cube textured, rolling assisted biaxially textured substrates (RABiTS) of pure nickel was studied with respect to the oxidation time (tox) and temperature(tox), in oxygen and air. Single phase (100) NiO formed only in a narrow temperature range centred on 1240-1260°C (∼1250±10°C). At lower or higher temperatures, other orientations, namely (111), (311) and (220) also formed. At the optimum temperature of 1250±10°C, formation of practically single phase (100) NiO was observed for short oxidation, tox ≤ 10 min and for long oxidation,tox ≥ 120 min.

Original languageEnglish
Pages (from-to)3531-3536
Number of pages6
JournalMaterials Science Forum
Issue number4
Publication statusPublished - 2003
EventThermec 2003 Processing and Manufacturing of Advanced Materials - Madrid, Spain
Duration: 2003 Jul 72003 Jul 11

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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