TiN/AIN nano-multilayer films were prepared on single crystal silicon wafer and high-speed steel using a new sputtering setup designed and manufactured based on high-rate reactive magnetron sputtering. Thus a group of TiN/AIN nano-multilayer films with various periods were prepared by properly controlling the deposition conditions, and the influence of the deposition parameters, especially the N2 flux and periods on the hardness, thickness, composition, and wear resistance of the multilayers was investigated. Moreover, the multilayers were also sputtered on micro-drills and turning cutters as the antiwear coatings. And their effectiveness in increasing the wear-resistance of the drilling and cutting tools in machining circuit board and medium carbon steel bar, respectively, was examined so as to explore their feasibility in actual machining. The results revealed that the TiN/AIN nano-multilayer films with periods of 2.4-67.6 nm were obtained by properly controlling the deposition parameters. The sputtered multilayers of periods ≤3.6 nm had extremely high hardness, good bonding strength to the substrate, and excellent wear-resistance. The field test confirmed that the TiN/AIN nano-multilayer was superior to traditional single-layer TiN film in terms of the ability to increase the wear-resistance of the machining tools in actual machining process.
|Number of pages||7|
|Publication status||Published - 2005 May 1|
All Science Journal Classification (ASJC) codes
- Mechanics of Materials
- Mechanical Engineering
- Surfaces, Coatings and Films
- Materials Chemistry