Sub-0.1 μm MOSFET fabrication using 248 nm lithography by resist trimming technique in high density plasmas

Chian Yuh Sin, Loh Wei Loong, Bing Hung Chen, Yujie, Pradeep Yelehanka, Lap Chan

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds