Sub-centimeter micromachined electron microscope

A. V. Crewe, A. D. Feinerman, D. A. Crewe, Dung-Ching Perng, S. E. Shoaf

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

A new approach for fabricating macroscopic (— 10X 10X10 mm3 structures with micrometer accuracy has been developed. This approach combines the precision of semiconductor processing and fiber optic technologies. A (100) silicon wafer is anisotropicaily etched to create four orthogonal v-grooves and an aperture on each 10 X 12 mm die. Precision 308 μm optical fibers are sandwiched between the die to align the v-grooves. The fiber is then anodically bonded to the die above and below it. This procedure is repeated to create thick structures and a stack of 5 or 6 die will be used to create a miniature scanning electron microscope (MSEM). Two die in the structure will have a segmented electrode to deflect the beam and correct for astigmatism. The entire structure is ultrahigh vacuum compatible. The performance of a SEM improves as its length is reduced and a suh-cm 2 keV MSEM with a field emission source should have approximately 1 nm resolution. A low-voltage high-resolution MSEM would be useful for the examination of biological specimens and semiconductors with a minimum of damage. The first MSEM will be tested with existing 6 μm thermionic sources. In the future a micromachined field emission source will be used. The stacking technology presented in this paper can produce an array of MSEMs 1–30 mm in length with a 1 mm or larger period. A key question being addressed by this research is the optimum size for a low-voltage MSEM which will be determined by the required spatial resolution, field of view, and working distance.

Original languageEnglish
Pages (from-to)611-616
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume10
Issue number4
DOIs
Publication statusPublished - 1992 Jan 1

Fingerprint

Electron microscopes
electron microscopes
Scanning
scanning
grooves
Field emission
low voltage
field emission
Semiconductor materials
thermionics
astigmatism
Ultrahigh vacuum
Electric potential
Silicon wafers
Fiber optics
ultrahigh vacuum
field of view
micrometers
Optical fibers
fiber optics

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Crewe, A. V. ; Feinerman, A. D. ; Crewe, D. A. ; Perng, Dung-Ching ; Shoaf, S. E. / Sub-centimeter micromachined electron microscope. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 1992 ; Vol. 10, No. 4. pp. 611-616.
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Sub-centimeter micromachined electron microscope. / Crewe, A. V.; Feinerman, A. D.; Crewe, D. A.; Perng, Dung-Ching; Shoaf, S. E.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 10, No. 4, 01.01.1992, p. 611-616.

Research output: Contribution to journalArticle

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