Sub-micrometer photochromic patterns using laser induced molecular implantation techniques (LIMIT)

Jonathan Hobley, Masahiro Goto, Maki Kishimoto, Hiroshi Fukumura, Hiroshi Uji-i, Masahiro Irie

Research output: Contribution to journalConference articlepeer-review

9 Citations (Scopus)

Abstract

Limit is a new approach for creating highly space selective patterns of molecules in thin polymer films. Photochromic implants of <800 nm dimensions are now possible using interference modulated implantation. In this way implanted diffraction gratings have been made which operate as photo-switching optical devices. Here we report the implantation of four different classes of organic photochromic molecule.

Original languageEnglish
Pages (from-to)299-304
Number of pages6
JournalMolecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume345
DOIs
Publication statusPublished - 2000
Event3rd International Symposium on Organic Photochromism (ISOP99) - Fukuoka, Jpn
Duration: 1999 Nov 141999 Nov 18

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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