Substrate-dependant chemical stability and conductivity of LaNiO 3 - X thin films

Chun Lung Hsiao, Xiaoding Qi

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)


This work studies the chemical stability and the changes of structure and electrical conductivity of LaNiO3 - x films under the low oxygen partial pressure (pO2) atmosphere. Polycrystalline and epitaxial LaNiO3 - x films were grown on a number of substrates including Si, LaAlO3 and SrTiO3 by sol-gel method. A range of structural and electrical characterizations were carried out for the grown films. The results showed that the chemical stability and oxygen stoichiometry of the LaNiO3 - x films were substrate-dependent, as well as influenced by the preparation process. The compressive strain introduced by the heteroepitaxial growth helped the films to keep a higher oxygen stoichiometry and therefore showed a higher conductivity than the polycrystalline and stretched epitaxial films. The epitaxial films, in particular under the tensile strain, showed a higher stability with a slower oxygen loss rate in vacuum at high temperature.

Original languageEnglish
Pages (from-to)356-359
Number of pages4
JournalThin Solid Films
Publication statusPublished - 2013 Feb 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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