Suppressing the lateral growth of gallium nitride nanowires by introducing hydrogen plasma

Tung Hsien Wu, Franklin Chau Nan Hong

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, we have found that the lateral homoepitaxial growth on GaN nanowires is suppressed by introducing hydrogen gas into the plasma-enhanced chemical vapor deposition (PECVD) apparatus for the growth of GaN nanowires. The formation of GaHx (x = 2, 3) species due to the reaction between gallium atoms and hydrogen plasma is shown to decrease the amount of excess gallium atoms adsorbed on GaN nanowire surfaces, which results in the elimination of nucleation on the nanowire surface and thus improves the surface smoothness of the nanowire. The stacked-cone nanostructures appear under low hydrogen or hydrogen-less conditions, but completely disappear under high hydrogen conditions in the PECVD system. The mechanism of the elimination of lateral growth on the nanowire surface is further proposed.

Original languageEnglish
Pages (from-to)133-137
Number of pages5
JournalThin Solid Films
Volume529
DOIs
Publication statusPublished - 2013 Feb 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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