Surface analysis of (NH4)2Sx-treated InGaN using x-ray photoelectron spectroscopy

Yow Jon Lin, Ching Ting Lee

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)


The surface analysis of (NH4)2Sx treated indium gallium nitride (InGaN) was presented using x-ray photoelectron spectroscopy. The epitaxial layers were grown on c-plane sapphire substrates using a metal-organic chemical vapor deposition (MOCVD) system. A peak with a binding energy of 532.7 eV was observed on the cleaned InGaN surface. The evidences for the formation of GaSx and InSy surface passivation species on the InGaN surface were also found.

Original languageEnglish
Pages (from-to)1734-1738
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number5
Publication statusPublished - 2001 Sep 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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