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Surface characterization of homoepitaxial β-FeSi2 film on β-FeSi2 (111) substrate by X-ray photoelectron and absorption spectroscopy

  • F. Esaka
  • , H. Yamamoto
  • , H. Udono
  • , N. Matsubayashi
  • , K. Yamaguchi
  • , S. Shamoto
  • , M. Magara
  • , T. Kimura

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