TY - JOUR
T1 - Surface properties of the AlGaN/GaN superlattice grown at different temperatures by metalorganic chemical vapor deposition
AU - Lai, Wei Chih
AU - Kuo, Cheng Huang
AU - Yen, Wei Yu
AU - Sheu, Jinng Kong
AU - Chang, Shoou Jinng
N1 - Copyright:
Copyright 2009 Elsevier B.V., All rights reserved.
PY - 2008/12/19
Y1 - 2008/12/19
N2 - AlGaN/GaN strained layer superlattice (SLS) structures were prepared by metalorganic vapor deposition (MOCVD) under various growth conditions. It was found that the surface morphology and V-shaped pits were determined by growth temperature. Two different types of pit were observed namely, minute pits and open V-shape pits, in scanning electronic microscopy (SEM) and atomic force microscopy (AFM) images. The density of minute pits of AlGaN/GaN SLS decreased with increasing growth temperature. It was also found that the groovelike and striplike shapes of the surface morphology of the samples prepared at 800°C revealed a preferred orientation at about 30° angle to the flat side of the substrate, but this preferred orientation was disrupted at a higher growth temperature. The samples prepared at 850 and 900°C exhibited a higher PL intensity with a peak wavelength of about 363 nm because of the improvement in the crystal quality of AlGaN/GaN SLS.
AB - AlGaN/GaN strained layer superlattice (SLS) structures were prepared by metalorganic vapor deposition (MOCVD) under various growth conditions. It was found that the surface morphology and V-shaped pits were determined by growth temperature. Two different types of pit were observed namely, minute pits and open V-shape pits, in scanning electronic microscopy (SEM) and atomic force microscopy (AFM) images. The density of minute pits of AlGaN/GaN SLS decreased with increasing growth temperature. It was also found that the groovelike and striplike shapes of the surface morphology of the samples prepared at 800°C revealed a preferred orientation at about 30° angle to the flat side of the substrate, but this preferred orientation was disrupted at a higher growth temperature. The samples prepared at 850 and 900°C exhibited a higher PL intensity with a peak wavelength of about 363 nm because of the improvement in the crystal quality of AlGaN/GaN SLS.
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U2 - 10.1143/JJAP.47.8730
DO - 10.1143/JJAP.47.8730
M3 - Article
AN - SCOPUS:59349099821
VL - 47
SP - 8730
EP - 8732
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
SN - 0021-4922
IS - 12
ER -