Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

Jui-Hsiang Liu, Ching Dong Hsieh, Chun Chieh Tseng

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-l,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists.

Original languageEnglish
Pages (from-to)1505-1514
Number of pages10
JournalJournal of Applied Polymer Science
Volume96
Issue number5
DOIs
Publication statusPublished - 2005 Jun 5

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Photoresists
Polymers
Copolymers
Methacrylates
Anhydrides
Molecular structure
Physical properties
Molecular weight
Plasmas
Acids

All Science Journal Classification (ASJC) codes

  • Polymers and Plastics

Cite this

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abstract = "To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-l,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists.",
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Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same. / Liu, Jui-Hsiang; Hsieh, Ching Dong; Tseng, Chun Chieh.

In: Journal of Applied Polymer Science, Vol. 96, No. 5, 05.06.2005, p. 1505-1514.

Research output: Contribution to journalArticle

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