Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same

Jui Hsiang Liu, Ching Dong Hsieh, Chun Chieh Tseng

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6-endo,oxo-l,2,3,6-tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t-butyl methacrylate (t-BMA), and 2-norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists.

Original languageEnglish
Pages (from-to)1505-1514
Number of pages10
JournalJournal of Applied Polymer Science
Volume96
Issue number5
DOIs
Publication statusPublished - 2005 Jun 5

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Polymers and Plastics
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same'. Together they form a unique fingerprint.

  • Cite this