Synthesis of cobalt nanoparticles by DC magnetron sputtering and the effects of electron bombardment

Bing Xian Chung, Chuan Pu Liu

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Dispersive cobalt nanoparticles are fabricated during deposition on SiO2/Si (001) substrates by direct current (DC) magnetron sputtering at room temperature. It is found that Co nanoparticles ranging from a few nanometers to some tens of nanometers in diameter can be fabricated by applying positive substrate biases. Larger polycrystalline cobalt nanoparticles are formed by the coalescence from smaller single-crystalline ones which may exist in fcc or hcp phase. Size reduction and uniformity of the nanoparticle array can be further enhanced by applying larger positive biases due to electron charging effects. Under the charging effects, the growth kinetics can be altered from VW to SK-like growth mode.

Original languageEnglish
Pages (from-to)1437-1440
Number of pages4
JournalMaterials Letters
Volume58
Issue number9
DOIs
Publication statusPublished - 2004 Jan 2

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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