Systematic layout planning: A study on semiconductor wafer fabrication facilities

Taho Yang, Chao Ton Su, Yuan Ru Hsu

Research output: Contribution to journalArticlepeer-review

84 Citations (Scopus)

Abstract

This paper proposes to use Muther's systematic layout planning procedure as the infrastructure to solve a fab layout design problem. A multiple objective decision making tool, analytic hierarchy process, is then proposed to evaluate the design alternatives. The proposed procedure is illustrated to be a viable approach for solving a fab layout design problem through a real-world case study. It features both the simplicity of the design process and the objectivity of the multiple-criteria evaluation process as opposed to existing solution methodologies.

Original languageEnglish
Pages (from-to)1359-1371
Number of pages13
JournalInternational Journal of Operations and Production Management
Volume20
Issue number11
DOIs
Publication statusPublished - 2000 Dec 1

All Science Journal Classification (ASJC) codes

  • Decision Sciences(all)
  • Strategy and Management
  • Management of Technology and Innovation

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