Tantalum oxide film deposited by vacuum cathodic arc plasma with improved electrochromic performance

Po Wen Chen; Chen Te Chang; Md Manirul Ali; Jin Yu Wu; Yu Chen Li; Meng Hsin Chen; Der Jun Jan; Chi Tsu Yuan

doi:10.1016/j.solmat.2018.02.034

Tantalum oxide film deposited by vacuum cathodic arc plasma with improved electrochromic performance

Po Wen Chen, Chen Te Chang, Md Manirul Ali, Jin Yu Wu, Yu Chen Li, Meng Hsin Chen, Der Jun Jan, Chi Tsu Yuan

Department of Physics

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

Inorganic solid-state electrochromic devices (ECDs) based on tantalum oxide (Ta₂O₅) as ion conductor layer were fabricated by vacuum cathodic arc plasma (CAP) deposition. This work focuses on key factor of fabricating Ta₂O₅ film deposited by CAP through four different ratios of oxygen and argon. Our results show that refractive index mostly decreased with increasing oxygen flow rate. Refractive index of 1.9 was achieved for Ta ₂O₅ film with O₂/Ar = 2.4 which provided high ion conduction pathways through a highly porous structure. We also observed higher ionic conductivity σ_i=3.5×10⁻⁶Scm⁻¹ for Ta₂O₅ film at O₂/Ar = 2.4 which enhanced ion's mobility for ECDs causing rapid coloring/bleaching phenomenon. As a result, excellent optical density and rapid response times were observed in fabricated device with an area of 20 cm², exhibiting optical density of 0.63 (@550 nm) and transmittance variation T = 50% (@550 nm) with the bleaching time= 5 s and transmittance variation T = 50% (@550 nm) with the coloring time = 13 s.

Original language	English
Pages (from-to)	188-195
Number of pages	8
Journal	Solar Energy Materials and Solar Cells
Volume	182
DOIs	https://doi.org/10.1016/j.solmat.2018.02.034
Publication status	Published - 2018 Aug 1

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Renewable Energy, Sustainability and the Environment
Surfaces, Coatings and Films

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10.1016/j.solmat.2018.02.034

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title = "Tantalum oxide film deposited by vacuum cathodic arc plasma with improved electrochromic performance",

abstract = "Inorganic solid-state electrochromic devices (ECDs) based on tantalum oxide (Ta2O5) as ion conductor layer were fabricated by vacuum cathodic arc plasma (CAP) deposition. This work focuses on key factor of fabricating Ta2O5 film deposited by CAP through four different ratios of oxygen and argon. Our results show that refractive index mostly decreased with increasing oxygen flow rate. Refractive index of 1.9 was achieved for Ta 2O5 film with O2/Ar = 2.4 which provided high ion conduction pathways through a highly porous structure. We also observed higher ionic conductivity σi=3.5×10−6Scm−1 for Ta2O5 film at O2/Ar = 2.4 which enhanced ion's mobility for ECDs causing rapid coloring/bleaching phenomenon. As a result, excellent optical density and rapid response times were observed in fabricated device with an area of 20 cm2, exhibiting optical density of 0.63 (@550 nm) and transmittance variation T = 50% (@550 nm) with the bleaching time= 5 s and transmittance variation T = 50% (@550 nm) with the coloring time = 13 s.",

author = "Chen, {Po Wen} and Chang, {Chen Te} and Ali, {Md Manirul} and Wu, {Jin Yu} and Li, {Yu Chen} and Chen, {Meng Hsin} and Jan, {Der Jun} and Yuan, {Chi Tsu}",

note = "Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2018",

month = aug,

day = "1",

doi = "10.1016/j.solmat.2018.02.034",

language = "English",

volume = "182",

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journal = "Solar Energy Materials and Solar Cells",

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T1 - Tantalum oxide film deposited by vacuum cathodic arc plasma with improved electrochromic performance

AU - Chen, Po Wen

AU - Chang, Chen Te

AU - Ali, Md Manirul

AU - Wu, Jin Yu

AU - Li, Yu Chen

AU - Chen, Meng Hsin

AU - Jan, Der Jun

AU - Yuan, Chi Tsu

PY - 2018/8/1

Y1 - 2018/8/1

N2 - Inorganic solid-state electrochromic devices (ECDs) based on tantalum oxide (Ta2O5) as ion conductor layer were fabricated by vacuum cathodic arc plasma (CAP) deposition. This work focuses on key factor of fabricating Ta2O5 film deposited by CAP through four different ratios of oxygen and argon. Our results show that refractive index mostly decreased with increasing oxygen flow rate. Refractive index of 1.9 was achieved for Ta 2O5 film with O2/Ar = 2.4 which provided high ion conduction pathways through a highly porous structure. We also observed higher ionic conductivity σi=3.5×10−6Scm−1 for Ta2O5 film at O2/Ar = 2.4 which enhanced ion's mobility for ECDs causing rapid coloring/bleaching phenomenon. As a result, excellent optical density and rapid response times were observed in fabricated device with an area of 20 cm2, exhibiting optical density of 0.63 (@550 nm) and transmittance variation T = 50% (@550 nm) with the bleaching time= 5 s and transmittance variation T = 50% (@550 nm) with the coloring time = 13 s.

AB - Inorganic solid-state electrochromic devices (ECDs) based on tantalum oxide (Ta2O5) as ion conductor layer were fabricated by vacuum cathodic arc plasma (CAP) deposition. This work focuses on key factor of fabricating Ta2O5 film deposited by CAP through four different ratios of oxygen and argon. Our results show that refractive index mostly decreased with increasing oxygen flow rate. Refractive index of 1.9 was achieved for Ta 2O5 film with O2/Ar = 2.4 which provided high ion conduction pathways through a highly porous structure. We also observed higher ionic conductivity σi=3.5×10−6Scm−1 for Ta2O5 film at O2/Ar = 2.4 which enhanced ion's mobility for ECDs causing rapid coloring/bleaching phenomenon. As a result, excellent optical density and rapid response times were observed in fabricated device with an area of 20 cm2, exhibiting optical density of 0.63 (@550 nm) and transmittance variation T = 50% (@550 nm) with the bleaching time= 5 s and transmittance variation T = 50% (@550 nm) with the coloring time = 13 s.

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JO - Solar Energy Materials and Solar Cells

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Tantalum oxide film deposited by vacuum cathodic arc plasma with improved electrochromic performance

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