The 3D display and analysis of the pattern of photolithography

Lih Shyang Chen, Young Jinn Lay, Lian Yong Lin, Jing Jou Tang, Wen Lin Cheng, Yu Jen Lin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

Original languageEnglish
Title of host publicationComputational Collective Intelligence
Subtitle of host publicationTechnologies and Applications - Second International Conference, ICCCI 2010, Proceedings
Pages117-127
Number of pages11
EditionPART 1
DOIs
Publication statusPublished - 2010 Dec 3
Event2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010 - Kaohsiung, Taiwan
Duration: 2010 Nov 102010 Nov 12

Publication series

NameLecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)
NumberPART 1
Volume6421 LNAI
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Other

Other2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010
CountryTaiwan
CityKaohsiung
Period10-11-1010-11-12

All Science Journal Classification (ASJC) codes

  • Theoretical Computer Science
  • Computer Science(all)

Fingerprint Dive into the research topics of 'The 3D display and analysis of the pattern of photolithography'. Together they form a unique fingerprint.

  • Cite this

    Chen, L. S., Lay, Y. J., Lin, L. Y., Tang, J. J., Cheng, W. L., & Lin, Y. J. (2010). The 3D display and analysis of the pattern of photolithography. In Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings (PART 1 ed., pp. 117-127). (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6421 LNAI, No. PART 1). https://doi.org/10.1007/978-3-642-16693-8_13