The 3D display and analysis of the pattern of photolithography

Lih-Shyang Chen, Young Jinn Lay, Lian Yong Lin, Jing Jou Tang, Wen Lin Cheng, Yu Jen Lin

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

Original languageEnglish
Title of host publicationComputational Collective Intelligence
Subtitle of host publicationTechnologies and Applications - Second International Conference, ICCCI 2010, Proceedings
Pages117-127
Number of pages11
EditionPART 1
DOIs
Publication statusPublished - 2010 Dec 3
Event2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010 - Kaohsiung, Taiwan
Duration: 2010 Nov 102010 Nov 12

Publication series

NameLecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)
NumberPART 1
Volume6421 LNAI
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Other

Other2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010
CountryTaiwan
CityKaohsiung
Period10-11-1010-11-12

Fingerprint

3D Display
Photolithography
Integrated Circuits
Integrated circuits
Display devices
Proximity Effect
Proximity
Resolution Enhancement
Production Line
Lithography
Mask
Masks
Semiconductors
Fabrication
Visualization
Semiconductor materials
Networks (circuits)
Simulation

All Science Journal Classification (ASJC) codes

  • Theoretical Computer Science
  • Computer Science(all)

Cite this

Chen, L-S., Lay, Y. J., Lin, L. Y., Tang, J. J., Cheng, W. L., & Lin, Y. J. (2010). The 3D display and analysis of the pattern of photolithography. In Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings (PART 1 ed., pp. 117-127). (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6421 LNAI, No. PART 1). https://doi.org/10.1007/978-3-642-16693-8_13
Chen, Lih-Shyang ; Lay, Young Jinn ; Lin, Lian Yong ; Tang, Jing Jou ; Cheng, Wen Lin ; Lin, Yu Jen. / The 3D display and analysis of the pattern of photolithography. Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1. ed. 2010. pp. 117-127 (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); PART 1).
@inproceedings{369585ee97404faca445fba2139e09d9,
title = "The 3D display and analysis of the pattern of photolithography",
abstract = "As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called {"}3D Builder{"}, to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.",
author = "Lih-Shyang Chen and Lay, {Young Jinn} and Lin, {Lian Yong} and Tang, {Jing Jou} and Cheng, {Wen Lin} and Lin, {Yu Jen}",
year = "2010",
month = "12",
day = "3",
doi = "10.1007/978-3-642-16693-8_13",
language = "English",
isbn = "364216692X",
series = "Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)",
number = "PART 1",
pages = "117--127",
booktitle = "Computational Collective Intelligence",
edition = "PART 1",

}

Chen, L-S, Lay, YJ, Lin, LY, Tang, JJ, Cheng, WL & Lin, YJ 2010, The 3D display and analysis of the pattern of photolithography. in Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1 edn, Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics), no. PART 1, vol. 6421 LNAI, pp. 117-127, 2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010, Kaohsiung, Taiwan, 10-11-10. https://doi.org/10.1007/978-3-642-16693-8_13

The 3D display and analysis of the pattern of photolithography. / Chen, Lih-Shyang; Lay, Young Jinn; Lin, Lian Yong; Tang, Jing Jou; Cheng, Wen Lin; Lin, Yu Jen.

Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1. ed. 2010. p. 117-127 (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6421 LNAI, No. PART 1).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

TY - GEN

T1 - The 3D display and analysis of the pattern of photolithography

AU - Chen, Lih-Shyang

AU - Lay, Young Jinn

AU - Lin, Lian Yong

AU - Tang, Jing Jou

AU - Cheng, Wen Lin

AU - Lin, Yu Jen

PY - 2010/12/3

Y1 - 2010/12/3

N2 - As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

AB - As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

UR - http://www.scopus.com/inward/record.url?scp=78649510481&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78649510481&partnerID=8YFLogxK

U2 - 10.1007/978-3-642-16693-8_13

DO - 10.1007/978-3-642-16693-8_13

M3 - Conference contribution

SN - 364216692X

SN - 9783642166921

T3 - Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)

SP - 117

EP - 127

BT - Computational Collective Intelligence

ER -

Chen L-S, Lay YJ, Lin LY, Tang JJ, Cheng WL, Lin YJ. The 3D display and analysis of the pattern of photolithography. In Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1 ed. 2010. p. 117-127. (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); PART 1). https://doi.org/10.1007/978-3-642-16693-8_13