The 3D display and analysis of the pattern of photolithography

Lih Shyang Chen; Young Jinn Lay; Lian Yong Lin; Jing Jou Tang; Wen Lin Cheng; Yu Jen Lin

doi:10.1007/978-3-642-16693-8_13

The 3D display and analysis of the pattern of photolithography

Lih Shyang Chen, Young Jinn Lay, Lian Yong Lin, Jing Jou Tang, Wen Lin Cheng, Yu Jen Lin

Department of Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

Original language	English
Title of host publication	Computational Collective Intelligence
Subtitle of host publication	Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings
Pages	117-127
Number of pages	11
Edition	PART 1
DOIs	https://doi.org/10.1007/978-3-642-16693-8_13
Publication status	Published - 2010 Dec 3
Event	2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010 - Kaohsiung, Taiwan Duration: 2010 Nov 10 → 2010 Nov 12

Publication series

Name	Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics)
Number	PART 1
Volume	6421 LNAI
ISSN (Print)	0302-9743
ISSN (Electronic)	1611-3349

Other

Other	2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010
Country/Territory	Taiwan
City	Kaohsiung
Period	10-11-10 → 10-11-12

All Science Journal Classification (ASJC) codes

Theoretical Computer Science
Computer Science(all)

Access to Document

10.1007/978-3-642-16693-8_13

Cite this

Chen, L. S., Lay, Y. J., Lin, L. Y., Tang, J. J., Cheng, W. L., & Lin, Y. J. (2010). The 3D display and analysis of the pattern of photolithography. In Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings (PART 1 ed., pp. 117-127). (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6421 LNAI, No. PART 1). https://doi.org/10.1007/978-3-642-16693-8_13

Chen, Lih Shyang ; Lay, Young Jinn ; Lin, Lian Yong et al. / The 3D display and analysis of the pattern of photolithography. Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1. ed. 2010. pp. 117-127 (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); PART 1).

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abstract = "As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called {"}3D Builder{"}, to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.",

author = "Chen, {Lih Shyang} and Lay, {Young Jinn} and Lin, {Lian Yong} and Tang, {Jing Jou} and Cheng, {Wen Lin} and Lin, {Yu Jen}",

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Chen, LS, Lay, YJ, Lin, LY, Tang, JJ, Cheng, WL & Lin, YJ 2010, The 3D display and analysis of the pattern of photolithography. in Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1 edn, Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics), no. PART 1, vol. 6421 LNAI, pp. 117-127, 2nd International Conference on Computational Collective Intelligence - Technologies and Applications, ICCCI 2010, Kaohsiung, Taiwan, 10-11-10. https://doi.org/10.1007/978-3-642-16693-8_13

The 3D display and analysis of the pattern of photolithography. / Chen, Lih Shyang; Lay, Young Jinn; Lin, Lian Yong et al.

Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1. ed. 2010. p. 117-127 (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); Vol. 6421 LNAI, No. PART 1).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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AU - Lin, Yu Jen

PY - 2010/12/3

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AB - As semiconductor technology rapidly advances, lithography with high density and fine feature size has become the challenge for nanometer-scale integrated circuit fabrication. Unfortunately the optical proximity effects (OPE) will distort the developed patterns transferred from the mask patterns. Optical proximity correction (OPC) is one of the promising resolution enhancement techniques to improve the yield of IC (Integrated Circuit) production. In this paper, we develop a system, called "3D Builder", to enable the users to easily visualize the results of the simulation of the lithographic process and understand what the physical circuits may look like in the production line. With this visualization tool, the users can better understand the effect of OPE and how OPC should be applied to improve the yield of the IC production. As a result, the yield of the IC production can be increased.

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Chen LS, Lay YJ, Lin LY, Tang JJ, Cheng WL, Lin YJ. The 3D display and analysis of the pattern of photolithography. In Computational Collective Intelligence: Technologies and Applications - Second International Conference, ICCCI 2010, Proceedings. PART 1 ed. 2010. p. 117-127. (Lecture Notes in Computer Science (including subseries Lecture Notes in Artificial Intelligence and Lecture Notes in Bioinformatics); PART 1). doi: 10.1007/978-3-642-16693-8_13

The 3D display and analysis of the pattern of photolithography

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